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sputtering

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sputtering
▪ I. ˈsputtering, vbl. n. [f. as prec.] 1. a. The action of the verb in various senses; an instance of this.1719 Boyer Dict. Royal i, Crachotement,..Sputtering, Spitting often. 1837 Carlyle Fr. Rev. ii. iii. iv, A continual crackling and sputtering of riots from the whole face of France. 1844 Dicken... Oxford English Dictionary
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2024 The Sputtering, Human-Shaped Machine, January 13th
22 hours ago — Cheap Kmart laser light toy for cats - do you think this is cruel? It's proven mighty useful for when I ... Roman Empire's presence is strong in ...
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Check Engine Light Car Sputtering (All The Possible Cause & Fixes)
Nov 2, 2022Why your check engine light is one and car is sputtering. Typically, the check engine light turning on (and is blinking/flashing), it indicates that your vehicle engine is misfiring. And this would explain why you're getting sputtering as an additional symptom. Probably the most common reason for engine to sputter is lack of fuel.
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Sputtering out: Push for state gas price transparency fails in ...
4 hours ago — Senate Bill 6052 would have forced oil companies to disclose data on their profit margins and how much they make per gallon of gas in ...
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High-power impulse magnetron sputtering
High-power impulse magnetron sputtering (HIPIMS or HiPIMS, also known as high-power pulsed magnetron sputtering, HPPMS) is a method for physical vapor The peak power and the duty cycle are selected so as to maintain an average cathode power similar to conventional sputtering (1–10 W⋅cm−2). wikipedia.org
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CNN's Manu Raju Corners a Sputtering Jim Jordan Over ...
21 hours ago — CNN made House Judiciary Committee Chairman Jim Jordan (R-OH) squirm on Wednesday when a star correspondent confronted him for previously ...
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Sputter deposition
Pulsed laser deposition is a variant of the sputtering deposition technique in which a laser beam is used for sputtering. Ion-beam sputtering Ion-beam sputtering (IBS) is a method in which the target is external to the ion source. wikipedia.org
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Vera Yurasova
of cones during sputtering" (Rad. "For pioneering work in sputtering", 1981 (to the "Mother of Sputtering" and to the "Father of Sputtering"). wikipedia.org
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Electrodeless plasma excitation
plasmas using electrodes, like capacitively coupled plasmas that are of great interest for contemporary plasma research and applications: Firstly, no sputtering However, depending on ion energy, sputtering of the reactor walls or the substrate may still occur. wikipedia.org
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Nanostructured film
Films can be elemental in nature, formed by sputtering from a pure metal target such as copper, or composed of compound materials. Varying parameters such as the sputtering rate, substrate temperature, and sputtering interrupts allow the creation of films with a variety of different wikipedia.org
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A combinatorial thin film sputtering approach for synthesizing and ...
Based on the combinatorial-sputtering model described in our previous paper [23], to achieve a large composition library with a composition of Zr 50 Cu 40 Al 10 at the center point on the silicon wafer, the rf powers of zirconium, copper, and aluminum targets were estimated to be 225 W, 50 W, and 26 W, respectively. The solid lines in Fig. 2 (a) and (b) indicate the projected compositions at ...
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High purity titanium sputtering target and method of making
A high purity titanium polycrystalline target with uniform grain size and near ideal (103) crystallographic orientation and a method of making. Uniform grain size from 10 μm-500 μm is achieved by using a fine grain five inch diameter titanium billet produced by hot working an electron beam cast billet. Greater than 80% (103) crystallographic orientation is achieved while maintaining uniform ...
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VOx films prepared by RF magnetron sputtering
Vanadium oxide (VOx) film is a film material extensively used in the infrared thermal imaging detector, so it is important to study its deposition process and obtain the VOx films having high temperature coefficient of resistance (TCR). VOx films were deposited using RF magnetron sputtering with a high purity vanadium metal target (99.99%) at the room temperature. The influence of Ar/O2 ratio ... www.yygx.net
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高功率脉冲磁控溅射
高功率脉冲磁控溅射(High Power Impulse Magnetron Sputtering, HiPIMS，又称High Power Pulsed Magnetron Sputtering, HPPMS)是一种基于磁控溅射沉积的薄膜物理气相沉积方法。 wikipedia.org
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ISO标准 21164-2018 金属和其他无机涂料 - Silver coatings by DC magnetron sputtering ...
preface ISO (国际标准化组织) 是国家标准机构的全球联盟 (ISO 成员机构). 国际标准的制定通常通过ISO技术委员会进行 ...
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